Applied Pulsed Power, Inc.
Applied Pulsed Power's Products and Systems
Research and Development

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(c) Applied Pulsed Power, Inc.

R&D

Applied Pulsed Power conducts in-house R&D for ourselves and our customers.

 

Ion Diode Systems for Material Modifications

Please see the MAP I Ion Diode System.

 

Pulsed Inductive Breakdown Plasma Sources

Applied Pulsed Power has been developing pulsed inductive breakdown plasma sources for over ten years. Initially, hydrogen and nitrogen plasma sources were developed for the MAP ion diode system. Other plasma sources have been developed for NASA and DOE applications. Currently APP, with funding from the Department of Energy, is working on an argon ion source for the Heavy Ion Fusion program.

For the Heavy Ion Fusion program, we are developing a pulsed, inductively generated, streaming plasma ion source. It creates a highly directed plasma stream of an ion-flux density of up to ~1A/cm2. This neutral ion beam can be used as the ion source for heavy ion fusion accelerators. A poster (pdf) on this project was presented at the APS Department of Plasma Physics conference in 2003.

ion source chamber